TY - JOUR PY - 2018 J2 - Thin Solid Films SN - 0040-6090 T2 - Thin Solid Films VL - 657 DO - 10.1016.j.tsf.2018.05.004w TI - Transfer-free chemical vapor deposition of graphene on silicon substrate at atmospheric pressure: A sacrificial catalyst UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1659274 KW - Graphene KW - Sacrificial catalyst KW - Transfer-free deposition KW - Sheet resistance KW - Reflectance AU - Naghdi S AU - Rhee KY AU - Park SJ SP - 55 EP - 60 LA - Multi-Language ER -