TY - JOUR PY - 2018 J2 - Thin Solid Films SN - 0040-6090 T2 - Thin Solid Films VL - 645 DO - 10.1016/j.tsf.2017.10.031 TI - Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1609639 KW - Plasma enhanced chemical vapor deposition KW - Microwave plasma KW - mu c-Silicon KW - Spectroscopic ellipsometry AU - Altmannshofer S AU - Miller B AU - Holleitner AW AU - Boudaden J AU - Eisele I AU - Kutter C SP - 180 EP - 186 LA - Multi-Language ER -