TY - JOUR PY - 2015 J2 - Appl. Surf. Sci. SN - 0169-4332 T2 - Applied Surface Science VL - 343 DO - 10.1016/j.apsusc.2015.03.059 TI - Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1348512 KW - Focused ion beam (FIB) KW - Annealing KW - Silicon KW - Gallium KW - Molecular dynamics (MD) AU - Xiao YJ AU - Fang FZ AU - Xu ZW AU - Hu XT SP - 56 EP - 69 LA - English ER -