TY - JOUR PY - 2005 J2 - Korean J. Mater. Res. SN - 1225-0562 T2 - Korean Journal of Materials Research VL - 15 IS - 4 DO - 10.3740/MRSK.2005.15.4.275 TI - 원자층 증착법으로 성장한 HfO 2 박막의 제조 TI - Preparation of Hafnium Oxide Thin Films grown by Atomic Layer Deposition UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1291186 KW - ALD(Atomic Layer Deposion) KW - hafnium oxide KW - dielectric constant AU - 김희철 AU - 김민완 AU - 김형수 AU - 김혁종 AU - 손우근 AU - 정봉교 AU - 김석환 AU - 이상우 AU - 최병호 AU - Kim HC AU - Kim MW AU - Kim HS AU - Kim HJ AU - Sohn WK AU - Jeong BK AU - Kim SW AU - Lee SW AU - Choi BH SP - 275 EP - 280 LA - Multi-Language ER -