TY - JOUR PY - 2013 J2 - Curr. Appl. Phys. SN - 1567-1739 T2 - Current Applied Physics VL - 13 IS - 1 DO - 10.1016/j.cap.2012.06.012 TI - Real time feedback control of plasma density using a floating probe in semiconductor processing UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1071102 KW - Plasma KW - Semiconductor processing KW - PID control KW - Feedback KW - Inductively coupled plasma AU - Jang SH AU - Oh SJ AU - Lee YK AU - Chung CW SP - 76 EP - 79 LA - English ER -