TY - JOUR PY - 2011 J2 - Thin Solid Films SN - 0040-6090 T2 - Thin Solid Films VL - 519 IS - 12 DO - 10.1016/j.tsf.2011.01.194 TI - Effect of deposition temperature on chemical composition and electronic properties of amorphous carbon nitride (a-CNx) thin films grown by plasma assisted pulsed laser deposition UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1064808 KW - Carbon nitride KW - Thin films KW - Plasma assisted deposition KW - Pulse laser deposition KW - X-ray photoelectron spectroscopy KW - Surface conductivity AU - Cappelli E AU - Trucchi DM AU - Kaciulis S AU - Orlando S AU - Zanza A AU - Mezzi A SP - 4059 EP - 4063 LA - Multi-Language ER -