TY - JOUR PY - 2010 J2 - Thin Solid Films SN - 0040-6090 T2 - Thin Solid Films VL - 519 IS - 2 DO - 10.1016/j.tsf.2010.09.002 TI - Structural and electrical properties of thin Ho2O3 gate dielectrics UR - https://www.cheric.org/research/tech/periodicals/view.php?seq=1064229 KW - Holmium oxide KW - Gate dielectrics KW - X-ray diffraction KW - X-ray photoelectron spectroscopy KW - Sputtering AU - Pan TM AU - Chang WT AU - Chiu FC SP - 923 EP - 927 LA - Multi-Language ER -