Friction measurements on hot filament CVD diamond films deposited on etched tungsten carbide surfaces

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Abstract

Diamond-coated cemented carbides are a promising candidate for cutting tools, but a critical problem is the poor adhesion strength between the coating and the substrate. We have grown diamond films on WC-6%Co and WC-10%Co using hot filament CVD. Acid etching was necessary to remove Co from the substrate surfaces, and Co was more easily removed from the 10% Co sample. Scratch testing with a diamond stylus gave friction coefficients of 0.4–0.6. The standard deviation in the coefficient of friction during a pass was used as a measure of the adhesion quality when comparing films of similar morphology.

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Cited by (15)

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    Citation Excerpt :

    The other cause is the thermal expansion coefficient mismatch between the coating and substrate, which introduces thermal stress during the coating processing and leads to easy cracking and delamination of the coatings [1–4]. One straightforward way to eliminate the catalytic effect of Co is to partially etch Co using chemicals before diamond deposition [5–8]. However, this will deteriorate the toughness of carbide cutting tools.

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